Alumina (Aluminum Oxide) (siblings)
High-Purity Alumina (HPA, 4N – 5N for LED Sapphire & Semiconductor)
CAS: 1344-28-1
High-purity alumina (HPA) is the ultra-purified Al₂O₃ grade with purity 99.99% (4N) up to 99.999% (5N) used in three end-applications driving 2025–2030 demand growth: LED sapphire substrates (the dominant blue-LED epitaxy substrate), lithium-ion battery separator coatings (Al₂O₃-coated polyolefin separator for thermal-shutdown safety), and IGBT / SiC-MOSFET ceramic substrates for power-electronics modules used in EV traction inverters and AI data-center power supply. HPA is manufactured via either alkoxide hydrolysis (Sumitomo / Sasol process) or high-purity aluminum hydrolysis — both far more demanding than Bayer-process metallurgical alumina, with trace metal contamination (Na, K, Ca, Fe, Si) controlled to ppm or sub-ppm levels.
Specifications
| CAS Number | 1344-28-1 |
| Al₂O₃ Purity (4N grade) | ≥99.99% |
| Al₂O₃ Purity (4N5 grade) | ≥99.995% |
| Al₂O₃ Purity (5N grade) | ≥99.999% |
| Na Content (4N) | ≤10 ppm |
| K Content (4N) | ≤5 ppm |
| Ca Content (4N) | ≤5 ppm |
| Fe Content (4N) | ≤5 ppm |
| Si Content (4N) | ≤10 ppm |
| Crystal Form | α-Al₂O₃ (sintering grade) or γ-Al₂O₃ (precursor) |
| Particle Size D50 | 0.3 – 1.0 μm (battery separator); 50–200 nm (sub-micron HPA) |
| Specific Surface Area (BET) | 1 – 15 m²/g (α-phase); 80–200 m²/g (γ-phase precursor) |
| Production Method | Alkoxide hydrolysis (Sasol/Sumitomo) or high-purity Al hydrolysis |
| Standards | SEMI C2 grade (semiconductor); JIS H2106 (electronic) |
| Packaging | 5 kg / 25 kg foil-lined, double-bag, N₂-flushed |
Applications
- LED sapphire substrate crystal growth (Kyropoulos / EFG / HEM methods) — the dominant blue-LED substrate
- Li-ion battery separator coating — Al₂O₃-coated polyolefin (PE/PP) separator for thermal-shutdown safety in EV battery packs
- Semiconductor packaging substrates — DBC (direct-bonded copper) ceramic substrates for IGBT, SiC-MOSFET, GaN power modules
- Phosphor host material for white LED downconversion (YAG:Ce on HPA)
- Synthetic gemstone (lab-grown sapphire jewelry, watch crystals)
- Optical-grade Al₂O₃ for IR window components (military, aerospace)
- Catalytic substrate for high-purity petrochemical processes (sub-ppm metal contamination spec)
Key Features
- Purity gap to metallurgical alumina is ~3 orders of magnitude — different supply chain, different price tier ($20–80/kg vs $0.4/kg for MGA)
- LED sapphire substrate demand grows ~6% CAGR through 2030 driven by mini-LED and micro-LED display adoption
- Battery-separator coating is the fastest-growing HPA application (15–25% CAGR) — every EV consumes 50–200 g HPA on separator surface
- AI data-center power module substrate growth tracks NVIDIA H100 / B100 deployment — Al₂O₃ substrate is incumbent vs Si₃N₄ and AlN alternatives
- China supply led by Yantai Jinhe, China Aluminum, Xinjiang Joinworld; Japan/Korea/EU import dependence remains substantial
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Technical Details
Overview
High-purity alumina (HPA) is the ultra-purified Al₂O₃ grade with purity from 99.99% (4N) up to 99.999% (5N), used in three end-applications driving 2025–2030 demand growth: LED sapphire substrates (the dominant blue-LED epitaxy substrate), lithium-ion battery separator coatings (Al₂O₃-coated polyolefin separator for thermal-shutdown safety in EV battery packs), and IGBT / SiC-MOSFET ceramic substrates for power-electronics modules used in EV traction inverters and AI data-center power supply.
HPA is manufactured via either alkoxide hydrolysis (Sumitomo / Sasol process — react aluminum metal with ethanol or isopropanol to form aluminum alkoxide, then hydrolyze to high-purity Al(OH)₃ and calcine) or high-purity aluminum hydrolysis (dissolve 4N-aluminum in mineral acid, precipitate, calcine). Both routes are far more demanding than Bayer-process metallurgical alumina, with trace metal contamination (Na, K, Ca, Fe, Si) controlled to ppm or sub-ppm levels.
Pricing reflects the production economics: 4N HPA trades at $20–30/kg, 4N5 at $35–55/kg, 5N at $60–80/kg — roughly 50–150× metallurgical-grade alumina pricing. The market is bifurcated: bulk LED sapphire and battery-separator coating demand drives Chinese supply (Yantai Jinhe, China Aluminum subsidiaries, Xinjiang Joinworld, Sumitomo China), while semiconductor-grade IGBT substrate retains Japanese / Korean / EU import dependence for the highest 5N grades.
Technical Specifications
| Property | Value |
|---|---|
| Chemical Name | High-Purity Aluminum Oxide |
| CAS Number | 1344-28-1 |
| Al₂O₃ Purity (4N grade) | greater than or equal to 99.99% |
| Al₂O₃ Purity (4N5 grade) | greater than or equal to 99.995% |
| Al₂O₃ Purity (5N grade) | greater than or equal to 99.999% |
| Na Content (4N grade) | less than or equal to 10 ppm |
| K Content (4N grade) | less than or equal to 5 ppm |
| Ca Content (4N grade) | less than or equal to 5 ppm |
| Fe Content (4N grade) | less than or equal to 5 ppm |
| Si Content (4N grade) | less than or equal to 10 ppm |
| Cu / Zn / Cr / Ni / Ti / Mg (4N) | less than 5 ppm each |
| Trace Metal Total (5N grade) | less than 10 ppm total |
| Crystal Form | alpha-Al₂O₃ (sintering grade) or gamma-Al₂O₃ (precursor) |
| Particle Size D50 | 0.3 – 1.0 μm (battery separator); 0.5 – 10 μm (sapphire feedstock); 50–200 nm (sub-micron HPA) |
| Specific Surface Area (BET) | 1 – 15 m²/g (alpha-phase); 80–200 m²/g (gamma-phase precursor) |
| Sintered Body Density (after firing 1600°C) | greater than or equal to 99.5% theoretical (3.95+ g/cm³) |
| Production Method | Alkoxide hydrolysis (Sasol/Sumitomo) or high-purity Al hydrolysis |
| Standards | SEMI C2 grade (semiconductor); JIS H2106 (electronic) |
| Packaging | 5 kg / 25 kg foil-lined double-bag, N₂-flushed, with desiccant |
| Shelf Life | 24 months in sealed original packaging below 30°C |
Applications
LED Sapphire Substrate Crystal Growth
About 60% of HPA demand. 4N to 4N5 HPA is fed into Kyropoulos, EFG (edge-defined film-fed growth), or HEM (heat-exchanger method) sapphire-crystal growth furnaces, where the powder is melted at 2050°C in a tungsten or molybdenum crucible and crystallized as a single-crystal sapphire ingot. The ingot is sliced (typically 350–650 μm thick wafers) and polished into 2", 4", 6", 8" diameter substrates for blue/green/UV LED epitaxy. Sapphire is the dominant blue-LED substrate (vs SiC, GaN, AlN) due to cost and matured supply chain. The mini-LED and micro-LED display transition is driving HPA-sapphire demand at ~6% CAGR through 2030.
Lithium-Ion Battery Separator Coating
The fastest-growing HPA application — Al₂O₃ at 0.3–1.0 μm particle size, applied as a 1–4 μm thick coating on polyolefin (PE/PP) battery separator film. Function: thermal-shutdown safety in EV battery packs. When the cell enters thermal runaway at 130–160°C, the polyolefin separator shrinks; the Al₂O₃ coating layer remains dimensionally stable up to 1800°C and prevents electrode-electrode contact that would otherwise cause cell short-circuit and propagating fire. Every EV cell consumes 0.5–2 g HPA on separator surface — for a 100 kWh EV pack with ~7000 cells, that's 5–14 kg HPA per vehicle. Demand grows at 15–25% CAGR tracking EV sales.
Semiconductor / Power-Electronics Ceramic Substrate
About 15% of HPA demand. 4N5+ HPA is sintered into dense Al₂O₃ substrate plates used as DBC (direct-bonded copper) ceramic substrate for IGBT, SiC-MOSFET, GaN power modules. The Al₂O₃ substrate bonds copper traces on top and bottom; the copper traces carry the power-device current while the Al₂O₃ provides electrical isolation and heat-spreading to the heat sink. Al₂O₃ DBC competes against AlN (higher thermal conductivity at 170 W/m·K but 3–5× more expensive) and Si₃N₄ (better thermal-shock resistance but newer / smaller supply chain). EV traction inverters, solar inverters, industrial drives, and AI data-center power supply (NVIDIA H100 / B100 deployment) are the demand drivers.
Phosphor Host Material for White LED Downconversion
White LEDs are typically made by combining a blue-LED chip with YAG:Ce (yttrium-aluminum-garnet doped with cerium) phosphor that downconverts blue to yellow, producing white light. The YAG host is grown from HPA + yttrium oxide via a solid-state reaction at 1500°C. HPA must be 4N or higher to avoid dark-spot defects in the finished LED.
Synthetic Gemstone
Lab-grown sapphire and ruby jewelry, watch crystals (high-end Swiss watch movements), and synthetic-gemstone hobbyist applications use 4N HPA in Kyropoulos or Czochralski single-crystal growth. The product is a colored sapphire (chromium-doped → ruby; iron+titanium → blue sapphire; pure α-Al₂O₃ → colorless / white sapphire used as watch crystal).
Optical-Grade Al₂O₃ for IR / UV Windows
Sintered transparent alumina (made from sub-micron 4N5 HPA) for IR window components in military / aerospace systems and UV-transparent components for laser applications. The sintering must achieve >99.9% theoretical density with sub-micron grain size to avoid light scattering at the grain boundaries.
Catalytic Substrate for High-Purity Processes
Petrochemical processes requiring sub-ppm catalyst-poison contamination — semiconductor-process-gas purification, ultra-high-purity hydrogenation for pharma — use HPA-based catalysts. The catalyst support metals (Pt, Pd, Ru) are deposited on 4N HPA carrier rather than commodity activated alumina.
Selection Guide
For LED sapphire substrate growth — 4N to 4N5 HPA, alpha-phase, D50 0.5–10 μm. Critical: Fe + Si + Ti must be controlled to avoid sapphire color defects.
For Li-ion battery separator coating — 4N HPA at D50 0.3–1.0 μm, surface-treated or untreated depending on separator-mfg slurry formulation. Critical: particle-size distribution tightness — wide distributions cause coating layer non-uniformity.
For IGBT ceramic substrate — 4N5 to 5N HPA, alpha-phase, sub-micron particle size for high sintered density. Critical: trace mobile-ion (Na, K) below 50 ppm to prevent electrical-insulation degradation under thermal cycling.
For phosphor host (YAG:Ce) — 4N HPA, alpha or gamma phase acceptable. Critical: rare-earth contamination should be low to avoid spectral interference with the cerium emission.
For synthetic gemstone — 4N HPA, alpha-phase, particle size 1–10 μm. The growth furnace tolerates wider particle distribution.
For IR / UV optical components — 4N5 to 5N HPA, sub-micron particle. Critical: no hard agglomerates (cause scattering centers in the finished window).
Equivalent Grades
- Sasol Puralox HP / Catalox HP — global premium HPA (formerly Condea)
- Sumitomo Chemical AKP-50 / AKP-30 / AKP-G015 — Japanese 4N to 5N HPA series
- Showa Denko UA-5105 / UA-5305 — Japanese semiconductor-grade HPA
- Baikowski / Mathym — French premium HPA for catalysts and electronics
- Almatis HP series — global HPA for substrate and polishing
- Yantai Jinhe Chemical (China) — Chinese 4N HPA, sapphire-substrate and battery-separator grades
- Xinjiang Joinworld — Chinese HPA from high-purity aluminum hydrolysis route
- China Aluminum Henan Branch — Chinese 4N HPA from Sanmenxia integrated complex
- Generic Chinese 4N HPA — commodity grade, multi-supplier origin
The Japanese / Korean / Sumitomo / Sasol HPA retains premium positioning for the highest 5N grade where trace-metal control over 0.1 ppm is required; Chinese 4N HPA has reached commodity status for LED sapphire and battery-separator coating applications.
Al₂O₃
≥99.99% (4N) up to ≥99.999% (5N)
Particle Size
50 nm – 1 μm
Packaging
5–25 kg N₂-flushed foil bag
MOQ
100 kg
Lead Time
4–6 weeks Asia / 8–12 weeks EU/NA
Origin
Shandong (Yantai Jinhe), Xinjiang Joinworld
Availability
In Stock